离子溅射的英文

• ion sputtering

• "离子"英文翻译    ion
• "溅射"英文翻译    sputtering; spurting; disint ...
• "等离子溅射" 英文翻译 :    plasma spraying; plasma sputtering
• "离子溅射泵" 英文翻译 :    getter pump; getter-ion pump; ion sputtering pump; sputter ion pump; sputter-ion pump
• "重离子溅射" 英文翻译 :    heavy ion sputtering
• "等离子溅射设备" 英文翻译 :    plasma sputtering equipment
• "离子溅射镀膜台" 英文翻译 :    ion sputtering coator
• "等离子溅射复合刻蚀" 英文翻译 :    plasma sputter combined etching; pse
• "低压三极管离子溅射方法" 英文翻译 :    low pressure triode method
• "离子溅射质量分析仪" 英文翻译 :    ion sputtering mass analyzer; isma
• "两电极离子溅射装置" 英文翻译 :    diode sputter
• "直列式离子溅射装置" 英文翻译 :    in line sputterer
• "阴极电子溅射" 英文翻译 :    cathode stream
• "离子溅镀" 英文翻译 :    ion sputtering; sputtering ion; sputtering, ion
• "溅射离子泵" 英文翻译 :    sputter ion pump
• "离子束溅射" 英文翻译 :    ion beam sputtering; ion-beam sputtering
• "等离子阴极溅射" 英文翻译 :    cathode sputtering
• "多极溅射离子源" 英文翻译 :    multipole sputtering ion source
• "溅射离子质谱计" 英文翻译 :    sputter ion mass spectrometer
• "溅射" 英文翻译 :    [半] sputtering; spurting; disintegration; spotter
• "共溅射" 英文翻译 :    co-sputtering
• "溅射靶" 英文翻译 :    sputtering target
• "溅射泵" 英文翻译 :    sputter pump
• "溅射法" 英文翻译 :    sputter method
• "溅射率" 英文翻译 :    sputtering rate

• Ion sputtering coator
  离子溅射镀膜台
• In this paper based on the theory of the low energy electrons , the movement of the irons in the counter is analyzed . the theories of sputtering and secondary electron emission are discussed respectively . the irons " action and effect on the counter are putted forward
  本文从低能电子发射机理入手，分析了计数管内部离子运动情况，讨论了离子溅射和二次电子发射，提出了离子与计数管内壁相互作用及其对计数管的影响，给出了计数管内壁表面处理仿真图。
• Scanning electron microscopy : after fixed in 2 . 5 % glutaraldehyde made up in 0 . 1 m phosphate buffer ( ph 7 . 2 ) , the tissue of testis was post - fixed in 1 . 0 % oso4 , dehydrated in a progressive ethanol solution , dried and sputter - coated with gold , then observed with kyky - 1000b microscopy and photographed
  扫描电镜样品以2 . 5戊二醛( ph7 . 2 ， 0 . 1m lpbs缓冲液配制)和1锇酸双固定，酒精系列脱水，干燥，真空离子溅射仪喷金， kyky - 1000b型扫描电镜观察并拍照。
• The results of simulations are : i ) energies of the incident ions to the target are determined mainly by the voltage across the cathode sheath , with a majority of ions " energy vary around the sheath voltage ; ions nearly normally bombard the target ; ions mainly locate above the sputtering holes because of the influence of the magnetic field , and the incident ions mainly come from the region ; the ions undergo several collisions during transportation , but that do n ' t matter much
  主要模拟结果有： ? )入射离子到达靶面时的能量主要受到了射频辉光放电中阴极壳层西北工业大学硕士学位论文李阳平电压的影响，大部分离子的入射能量在阴极壳层电压值附近，离子溅射时接近于垂直入射;射频辉光放电受到阴极磁场的影响，等离子体中的离子主要集中在靶面溅射坑的上方，且入射离子主要来自这个区域;入射离子在输运过程中和背景气体分子有少量的碰撞，但影响不太大。