溅射靶的英文

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"溅射靶"怎么读用"溅射靶"造句

英文翻译手机版

sputtering target

"溅射"英文翻译 sputtering; spurting; disint ...
"靶"英文翻译 target
"射靶" 英文翻译 : shoot at the target
"溅射" 英文翻译 : [半] sputtering; spurting; disintegration; spotter
"反射靶" 英文翻译 : reflectance target; reflection target
"试射靶" 英文翻译 : sighting target; trial target
"透射靶" 英文翻译 : transmission target
"飞碟射靶" 英文翻译 : clay-pigeon range
"漫反射靶" 英文翻译 : diffuse reflecting target
"喷射靶机" 英文翻译 : jindivik
"共溅射" 英文翻译 : co-sputtering
"溅射泵" 英文翻译 : sputter pump
"溅射法" 英文翻译 : sputter method
"溅射率" 英文翻译 : sputtering rate
"溅射室" 英文翻译 : sputtering chamber
"溅射源" 英文翻译 : sputtering source
"冷溅射" 英文翻译 : cool sputtering
"教靶试射靶场" 英文翻译 : boresighting and fire-in range
"随走随射靶场" 英文翻译 : roving course
"军事射靶记录相机" 英文翻译 : gun camera
"薄膜溅射" 英文翻译 : thin film sputtering
"背面溅射" 英文翻译 : back spatter
"长抛溅射法" 英文翻译 : long throw sputtering method
"磁控管溅射" 英文翻译 : magnetron sputtering
"磁控溅射" 英文翻译 : magnetron sputtering; megnetron sputtering

例句与用法

Magnetron sputtering target source and sputtering procedure
磁控溅射靶源设计及溅射工艺研究
Aluminum alloy films and sputtering targets for semiconductor integrated circuit wiring and electrodes
集成电路电极布线用铝合金薄膜及其溅射靶材
Manufactures and fabricates high quality cadmium telluride , cadmium zinc telluride and related single crystal substrates
-主要从事光电晶体系列材料溅射靶材的制备和光学元器件研发与生产。
It make possible for the system to set and to change source current ( which is proportional to evaporation rate from the ms source ) during coating process
在镀膜过程中，保证了每个磁控溅射靶上电流的稳定控制和精确调整。
Uniform and compact plzt and sno _ 2 ceramic targets , which diameter were 212mm and 221mm , respectively , had been successfully fabricated . ( 2 ) a rotating magnetic field rf magnetron sputtering system had been designed and set up , which showed high utilization efficiency of target , high films uniformity , and high deposition rate , etc . ( 3 ) the plzt and sno _ 2 thin films were investigated by afm , xrd , sem , and spectral photometer . the optimized processing parameters of preparing these films had been found
并以此为基础分别制备了致密、均匀、平整、直径为212mm的plzt和221mm的sno _ 2陶瓷溅射靶材; ( 2 )为克服现有磁控溅射设备的不足,提出了一种新的磁控溅射方案,采用该方案的设备具有:靶材利用率高、镀膜均匀、成膜速度快等特点; ( 3 )运用afm 、 xrd 、 sem以及双光路分光光度计等分析手段对plzt和sno _ 2薄膜的微结构和性能进行研究,找到了制备plzt电光薄膜和sno2透明电极材料的最佳工艺条件。