离子束溅射的英文

• ion beam sputtering
• ion-beam sputtering

• "离子束"英文翻译    ion beam; ionic beam; ionic ...
• "溅射"英文翻译    sputtering; spurting; disint ...
• "离子束溅镀系统" 英文翻译 :    ion beam sputtering system
• "离子束" 英文翻译 :    [物理学] ion beam; ionic beam; ionic jet◇离子束成像 ion beam imaging; 离子束镀膜设备 ion beam deposition equipment; 离子束加工 ion beam machining; 离子束加工设备 ion beam process equipment; 离子束聚变装置 ion beam fusion device; 离子束抛光 ion beam polishing; 离子束扫描 ion-beam scanning; 离子束蒸发 ion beam evaporation; 离子束注入 ion beam injection
• "等离子溅射" 英文翻译 :    plasma spraying; plasma sputtering
• "溅射离子泵" 英文翻译 :    sputter ion pump
• "离子溅射" 英文翻译 :    ion sputtering
• "离子溅射泵" 英文翻译 :    getter pump; getter-ion pump; ion sputtering pump; sputter ion pump; sputter-ion pump
• "重离子溅射" 英文翻译 :    heavy ion sputtering
• "单色离子束" 英文翻译 :    monochromatic ion beam
• "负离子束" 英文翻译 :    negative ion beam
• "会聚离子束" 英文翻译 :    converging ion beam
• "活性离子束" 英文翻译 :    reactive ion beam
• "聚焦离子束" 英文翻译 :    focused ion beam
• "聚离子束" 英文翻译 :    beam focused ion; beam, focused ion (fib); focused-ion beam (fib)
• "离子束薄化" 英文翻译 :    ion-beam thinning
• "离子束成像" 英文翻译 :    ion beam imaging
• "离子束处理" 英文翻译 :    ion beam treatment
• "离子束穿孔" 英文翻译 :    ion beam drilling
• "离子束氮化" 英文翻译 :    ion beam nitridation
• "离子束电流" 英文翻译 :    ion beam current
• "离子束淀积" 英文翻译 :    ion beam deposition
• "离子束发散" 英文翻译 :    divergence of ion beam
• "离子束分析" 英文翻译 :    ion beam analysis
• "离子束腐蚀" 英文翻译 :    ion beam etching

• Property comparison of optical thin films prepared by e - beam , ion assisted deposition and ion beam sputtering
  离子辅助和离子束溅射三种工艺对光学薄膜性能的影响
• A control system for the thickness of ion beam sputter ( ibs ) coating is introduced in this paper . the basic principle of ibs coating machine is discussed . this paper also gives the scheme of hardware and sofeware
  本文介绍了离子束溅射镀膜机膜厚控制的一种实用的系统，文中论述了离子束溅射镀膜机的工作原理及镀膜厚度控制系统的硬、软件的实现方案。
• Abstract : based on the splashing mechanics microeffect ， this paper introduced the principle of ion beam removal machining it analysed the influenced factors of production efficiency ， studied the structure and working principle of the device of ion beam removal machining
  文摘:从离子束溅射的微观力效应出发，介绍了离子束去除加工的原理，分析了影响加工效率的因素，并对加工装置的结构及工作原理进行了探讨。
• We prepare the si - sio2 and ge - sio2 thin film by using the dual ion beam co - sputtering method and the rf co - sputtering technique respectively , adjusting the substrate temperature ( ts ) and the annealing temperature ( ta ) . then we analysis the structure of the thin film by using the xrd and tem
  论文采用双离子束溅射和射频磁控溅射沉积技术，通过改变薄膜沉积过程中基片温度( t _ s )以及薄膜制备完成后退火温度( t _ a )分别制备了si - sio _ 2和ge - sio _ 2薄膜。
• The influence of depositing condition on the depositing rate and the structure of the films were studied by the aid of tem and xrd . when the temperature ( ts < 450 , ta < 800 ) is low , the structure of the samples is still amorphous . the majority content of the sample is sio 90 by the aid of xps
  利用双离子束溅射沉积技术，通过共溅射方法制备了si - sio _ 2薄膜，研究了沉积时间、工作气压p _ ( ar ) 、基片温度等对沉积速率的影响，用tem和xrd分析了样品的结构。
• In this thesis , we research the characters on the ion beam sputtering system , and prepare tiny films and cnx / tiny multilayers by ion beam sputtering . the best parameters of preparing cnx films are explored . we use the tiny films as template to promote the growth of cnx films
  本文对离子源的溅射特性进行了研究，采用离子束溅射法制备了tin _ y单层薄膜和cn _ x tin _ y多层薄膜，探索该法制备cn _ x薄膜的最佳工艺参数，并利用tin _ y薄膜为衬底以促进cn _ x薄膜的生长。