直流溅射的英文

• direct current sputtering

• "直流"英文翻译    direct-current; constant cur ...
• "溅射"英文翻译    sputtering; spurting; disint ...
• "溅射" 英文翻译 :    [半] sputtering; spurting; disintegration; spotter
• "直流" 英文翻译 :    direct-current (dc); constant current; steady current; continuous current; zero-frequency current; unidirectional flow◇直流泵 [机械工程] straightway pump; 直流电机 continuous current dynamo; direct-current dynamo; direct-current machine; 直流电力机车 continuous current locomotive; d. c. electric locomotive; direct-current locomotive
• "共溅射" 英文翻译 :    co-sputtering
• "溅射靶" 英文翻译 :    sputtering target
• "溅射泵" 英文翻译 :    sputter pump
• "溅射法" 英文翻译 :    sputter method
• "溅射率" 英文翻译 :    sputtering rate
• "溅射室" 英文翻译 :    sputtering chamber
• "溅射源" 英文翻译 :    sputtering source
• "冷溅射" 英文翻译 :    cool sputtering
• "薄膜溅射" 英文翻译 :    thin film sputtering
• "背面溅射" 英文翻译 :    back spatter
• "长抛溅射法" 英文翻译 :    long throw sputtering method
• "磁控管溅射" 英文翻译 :    magnetron sputtering
• "磁控溅射" 英文翻译 :    magnetron sputtering; megnetron sputtering
• "等离子溅射" 英文翻译 :    plasma spraying; plasma sputtering
• "电化学溅射" 英文翻译 :    electrochemical supttering
• "对射频溅射" 英文翻译 :    rf double sputtering
• "二极管溅射" 英文翻译 :    diode sputtering
• "二极溅射" 英文翻译 :    diode sputtering
• "反应溅射" 英文翻译 :    reactive sputtering
• "反应溅射法" 英文翻译 :    reactive sputtering
• "反应溅射源" 英文翻译 :    reactive sputtering source

• Using jgp560c magnetron sputtering equipment , cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power , gas flow , vacuum air pressure , magnetoelectricity power and substrate temperature on deposition rate of film , discovered that dc sputtering power is the most key factor influencing the deposition rate
  在jgp560c型超高真空多功能磁控溅射镀膜机上，采用直流磁控溅射法在cdznte晶体上制备出cu ag合金薄膜，揭示了气体流量、直流溅射功率、励磁电源功率、工作气压和衬底温度等工艺参数对沉积速率的影响规律。结果表明溅射功率对沉积速率的影响最大，随溅射功率的增大沉积速率快速增大。
• Contrasting the results of simulation and the experiment for depositing the 3 inch thin films by icds technique , the center position of substrate and the target is in a 18mm offset , the thickness distribution homogeneity is under 8 % . based on the analyses of the theoretic heat distribution for the radiant heating system , a 3 inch size radiant heater fitting for the requirement is designed and made , whose temperature difference is under 6 %
  其次，对3英寸范围内的膜厚分布进行了理论模拟，在此基础上和试验结果对比分析，发现：在倒筒靶直流溅射装置下，如果采用一种让基片中心和靶中心处于相对偏心距离为18mm的位置来制备3英寸薄膜，其膜厚分布的均匀度范围控制在8以内。
• The purpose of this dissertation is to study the effect of substrate on the characteristics and microstructure of high temperature superconducting yba2cu3o7 - thin film , and well c - axis oriented epitaxial ybco thin films have been deposited on both laalo3 ( 100 ) and r - plane sapphire al2o3 ( 102 ) substrates by inverted cylindrical dc sputtering ( icds ) technique
  <中文摘要> =本论文的目的是研究基片对薄膜结构和性能的影响关系，采用倒筒靶直流溅射技术在在laalo3 ( 100 )和r -平面的蓝宝石（ al2o3 ( 102 ) ）两种基片上制备出c轴取向的外延高温超导yba2cu3o7 -薄膜。