高频离子源的英文
发音:
"高频离子源"怎么读用"高频离子源"造句
英文翻译手机版
- radio frequency ion source
- "高频"英文翻译 high frequency
- "离子源"英文翻译 ion gun; ion source; ionizat ...
- "射频离子源" 英文翻译 : radio-frequency ion source
- "高频离子腐蚀" 英文翻译 : high frequency ion etching
- "高频火花离子源" 英文翻译 : high frequency spark ion source
- "离子源" 英文翻译 : io ource; ionization source; source ion
- "射频离子堵漏" 英文翻译 : rf ion plug
- "高频离心铸造机" 英文翻译 : high frequency centrifugal casting machine
- "基频离子回旋波" 英文翻译 : first ion cyclotron wave
- "磁离子源" 英文翻译 : magnetic ion source
- "等离子源" 英文翻译 : plasma source
- "电弧离子源" 英文翻译 : arc source
- "负离子源" 英文翻译 : negative ion source
- "高离子源" 英文翻译 : high-intensity ion source
- "化学离子源" 英文翻译 : chemical ionization source; chemical ionzation source
- "火花离子源" 英文翻译 : spark ionization source; sparking ionization source
- "激光离子源" 英文翻译 : laser ion source
- "极化离子源" 英文翻译 : polarized ion source
- "聚焦离子源" 英文翻译 : focused beam ion source; focused ion source
- "离子源参数" 英文翻译 : source parameters
- "离子源磁铁" 英文翻译 : ion source magnet
- "离子源的" 英文翻译 : ionogenic
- "离子源头" 英文翻译 : ion-source head
- "离子源狭缝" 英文翻译 : source slit
- "炉状离子源" 英文翻译 : furnace source
例句与用法
- Construction of electrostatic accelerator rf ion source
用于静电加速器的高频离子源的设计和调试 - Three typical ion source , radio - frequency ion source , duoplasmatron ion source and penning ion source , are usually used in neutron generator
在通过d - t反应产生中子的低能倍压加速器中,一般采用三种类型的离子源:高频离子源( rf ) 、潘宁离子源( pig )和双等离子体离子源( dp ) 。 - ( 4 ) chapter vi . the theory of ion curren extraction of rf ion source is investigated , the reason of emission surface formation and its effect on ion curren extraction are reasearched emphatically
( 4 )对高频离子源的束流引出原理作了理论推导和分析,着重研究了发射面的形成及其对引出束流特性的影响。 - Finally , the characteristics of ion curren extraction in different conditions are simulationed with magic software , and the parameter of best emission surface is obtained
最后,采用magic程序对高频离子源不同引出参数下的束流引出特性进行了数值模拟,得到了获得最佳的引出离子束所要求的等离子体发射面参数。 - Among of them , radio - frequency ion source is in most wide used for the reasons of its high proton content , long life and reliable performance , etc . h - type radio - frequency ion source is a kind of plasma ion source
其中,高频离子源以其很高的质子比( 70 - 90 ) 、长寿命和可靠的性能而得到了最广泛的应用。高频h型放电离子源属于等离子体离子源。 - Distribution of electromagnet field in the space of h - type rf ion source is worked out derivation from maxwell equations , and three - dimensional vector graphs of e and b in the space of rf ion source are calculated and plotted by mafia software
并采用mafia软件进行了三维实体建模,计算了高频离子源放电击穿前和稳定工作后的电磁场分布,得到了高频离子源放电空间电磁场分布的直观图像。 - The conclusion that ez is more important during the breakdown of rf ion source is made out by comparing ez and e 6 before breakdown , and then , the breakdown criterion of rf ion source is deduced , and the relation between breakdown voltage and pressure is analyzed too
通过比较击穿前高频电场的轴向和幅向分量,得出了轴向电场在高频离子源击穿中起主要作用的结论,并进而推导出了高频离子源的击穿判据,得出了气体击穿时离子源击穿电压和放电管内气压的关系。 - During ion source operating , alternating axial magnetic field and azimuthal electric field in discharge tube ionize hydrogen gas purified by hot palladium pipe , and form plasma , hi fifties year , research reports studied on rf ion source are numerous however most of them are concerned about application , and research reports relevant to discharge theory or experiment model are unfrequent
离子源工作时,放电空间交变的轴向磁场和涡漩电场激发放电管中经钯管纯化后通入的氢气电离,形成等离子体。 50多年来,关于高频离子源的研究报告很多,但是,这些研究主要都集中在应用研究方面,有关高频无极环形放电离子源的理论与实验模型研究不是很多。 - ( 3 ) chapter v . plasma characteristics of rf ion source is investigated . a zero - dimensional numerical dynamic colisional radiative atomic and molecular ( cram ) model is suggested to simulate the microphysical process . all species " population number densities in plasma are calculated in non - thermodynamics equilibrium condition , and proton content in extracted ion current are measured with 60 ? magnetic analyzer
( 3 )提出了高频离子源等离子体的零维cram模型( collisionalradiativeatomicandmolecularmodel ) ,计算了非平衡态( nte )下等离子体中分子、电子、离子、基态原子、激发态原子等粒子浓度,并在zf - 200kev中子发生器上,用60磁分析器实验测定了引出束流的质子比。 - Plasma characteristics of a rf ion source are investigated by emission spectroscopy . the spatiotemporal spectral line intensities of the first three atomic lines in hydrogen bahner series ( = 656 . 28 , 486 . 13 , 434 . 05nm ) of rf ion source plasma , are measured with calibrated optical multichannel analyzer ( oma ) . some plasma parameters , including electron temperature , hydrogen atom density and hydrogen ion density , are calculated and analyzed using partial local thermodynamic equilibrium ( plte ) theory and abel transform
实验采用绝对定标后的光学多道分析系统( oma )测定了离子源等离子体不同时间和空间位置的氢原子巴耳末谱线系中前三条谱线( = 656 . 28 , 486 . 13 , 434 . 05nm )的强度,并采用plte的理论和abel变换方法,计算出了高频离子源等离子体的电子温度、氢原子浓度、氢离子浓度等参数在放电的不同阶段和径向分布情况,并进行了简要分析。
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