物理气相沉积的英文

• physical vapor deposition
• physical vapour deposition
• pvd

• "物理"英文翻译    innate laws of things physic ...
• "气"英文翻译    gas
• "相"英文翻译    looks; appearance
• "沉积"英文翻译    deposit; sedimentation; depo ...
• "物理气相沉积法" 英文翻译 :    chemical vaporous depositon; physical vaporous deosition; pvd
• "电子束物理气相沉积法" 英文翻译 :    electron beam physical vapor deposition
• "气相沉积" 英文翻译 :    vapor deposition
• "气相沉积法" 英文翻译 :    mcvd; pcvd; plasma-enhanced chemical vapour deposition; vapour deposition process
• "物理气相淀积" 英文翻译 :    pvd
• "反应气相沉积" 英文翻译 :    reactive vapour deposition
• "化学气相沉积" 英文翻译 :    chemical vapor deposition process; cvd process
• "物理汽相沉积" 英文翻译 :    deposition physical vapor; deposition, physical vapor (pvd); physical vapor deposition (pvd)
• "低温化学气相沉积" 英文翻译 :    pcvd
• "低压化学气相沉积" 英文翻译 :    lpcvd
• "电化学气相沉积" 英文翻译 :    electrochemical vapour deposition
• "化学气相沉积法" 英文翻译 :    chemical vaporous depositon; pcvd
• "金属有机气相沉积" 英文翻译 :    metal organic chemical vapor deposition
• "气相沉积碳化钛" 英文翻译 :    vapour deposition of carbonized titanium
• "热化学气相沉积" 英文翻译 :    tcvd
• "增强化学气相沉积" 英文翻译 :    pcvd
• "等离子化学气相沉积" 英文翻译 :    pcvd; plasma chemical vapor deposition
• "等离子体化学气相沉积" 英文翻译 :    plasma activated chemical vapour deposition; plasma chemical vapour deposition
• "低压化学气相沉积法" 英文翻译 :    low pressure chemical vapor deposition (lpcvd)
• "改进的化学气相沉积法" 英文翻译 :    modified chemical vapor deposition process
• "化学气相沉积法设备" 英文翻译 :    equipment

• Specifications of physical vapour deposition tin films
  物理气相沉积tin薄膜技术条件
• Physical vaporous deosition
  物理气相沉积法
• The progress of monte - carlo simulation of the growth of thin films is reviewed
  摘要综述了蒙特卡罗方法模拟物理气相沉积薄膜生长的研究进展。
• And so on , the method of cvd and pvd were also discussed . through the theoretical calculation and experimental results , the distance between the diaphragm and the base plate was optimize , which will touch in case of over loading
  另外也对化学气相沉积法( cvd法)和物理气相沉积法( pvd法) (包括其中的溅射法)进行了探讨。
• The desensitized explosive petn film was prepared by physical vapour deposition ( pvd ) technology , and sem was used to analyze the microstructure and grain size of petn film
  摘要采用物理气相沉积( pvd )技术研制了钝化太安炸药薄膜，对薄膜的微观结构和颗粒粒度进行了分析，对颗粒粒度与薄膜爆轰波稳定传播临界尺寸的关系进行了探索。
• The study on low temperature pvd deposited sic film was carried out - m - employing bias assisted magnetron sputtering . furthermore , pvd deposited sic film mainly containing cubic phase was achieved at room temperature for . the first time
  采用偏压辅助rf溅射法，对低温物理气相沉积sic薄膜进行了研究，并首次在室温下制备出含有? sic构相并以其为主的sic薄膜。
• Were invited to share their research results ion plating technologies and recent industrial developments and pvd hard film research conducted by the advanced coatings applied research laboratory ( acarl ) that was funded by itc and sponsored by the industry
  ，与我们分享有关的研究成果，包括离子电镀技术和业界的最新发展，以及由先进涂层应用研究实验室进行的物理气相沉积硬膜。
• Rf magnetron sputtering that has been broadly used to fabricate a variety of thin films is a kind of physical vapor deposition ( pvd ) , which consists of two main microscopic processes , one is the generation and transportation of the vapor phase particles to form the thin film , the other is the diffusion and aggregation of the film atoms on substrate , which leads to the formation of the film
  射频磁控溅射是一种物理气相沉积技术，已被广泛地用于各种薄膜的制备。它主要包括成膜气相粒子(原子或分子)的产生和输运以及输运到衬底的成膜粒子在衬底上的扩散、聚集、生长成膜两大过程。
• Coating cracks and defects are main reasons for the limited oxidation resistance of sic - c / sic . in this thesis , surface modification of sic coating was carried out with physical vapor deposition ( pvd ) and ion implantation & deposition , using al , b and si . effects of the modified coatings on the oxidation resistance of sic - c / sic were studied with sem , xrd and aes and so on
  本文采用了物理气相沉积方法和离子注入沉积方法，以al 、 b 、 si为改性元素，对sic涂层表面进行改性，封填裂纹和缺陷；结合扫描电镜( sem ) 、 x射线衍射( xrd )和俄歇能谱( aes )分析，研究了改性层对sic - c sic复合材料抗氧化性能的影响。

• 物理气相沉积的法语：dépôt physique en phase vapeur
• 物理气相沉积的俄语：физическое осаждение паров
• 物理气相沉积的阿拉伯语：الترسيب الفيزيائي للبخار; ترسيب فيزيائي للبخار;
• 物理气相沉积的印尼文：pemendapan wap fizikal;