无掩模的英文

• maskless

• "无"英文翻译    not have; there is not; be w ...
• "掩"英文翻译    cover; hide
• "模"英文翻译    mould; pattern; matrix
• "无掩模法" 英文翻译 :    maskless process
• "无掩模离子注入" 英文翻译 :    maskless ion implantation
• "无掩模图像生成" 英文翻译 :    maskless pattern generation
• "掩模" 英文翻译 :    mask
• "无掩饰" 英文翻译 :    bald faced
• "无掩蔽的" 英文翻译 :    exposed
• "无掩蔽区" 英文翻译 :    unmasked region
• "无掩护的港" 英文翻译 :    open harbor; open harbour
• "无掩饰的" 英文翻译 :    bald-faced
• "铬掩模" 英文翻译 :    chrome mask; chromium mask
• "光掩模" 英文翻译 :    optical mask; photomasking
• "金掩模" 英文翻译 :    gold mask
• "扩掩模" 英文翻译 :    diffusion mask
• "母掩模" 英文翻译 :    master mask
• "掩模板" 英文翻译 :    mask plate; mask slice
• "掩模包" 英文翻译 :    mask pack
• "掩模窗" 英文翻译 :    mask hole
• "掩模法" 英文翻译 :    mask means
• "掩模盒" 英文翻译 :    mask cassette
• "掩模夹" 英文翻译 :    mask holder
• "掩模架" 英文翻译 :    mask holder
• "掩模框" 英文翻译 :    mask frame

• The prospect for the maskless lithography technology
  无掩模光刻技术的前景
• The beam division method in maskless laser interference photolithography can be divided into wave - front division and amplitude division
  摘要无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
• Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography
  模拟和实验结果表明，对点阵或孔阵图形，在同样的图形尺度下，无掩模干涉光刻比传统光刻简单得多。
• Based on light interference , diffraction and optical holography theory , the paper comprehensively describes the basic principle , main types , development trend as well as the objective and significance for carrying out the research of laser maskless interferometric lithography and holographic lithography
  本论文基于光的干涉和衍射及光学全息照相理论，综合评述了光学光刻的基本原理、主要类型、发展趋势及开展激光无掩模干涉光刻和全息光刻研究的目的和意义。
• The theoretical research , computer simulation and experimental results analysis show that maskless laser interferometric lithography and holographic lithography have the characteristics of large field of view , high resolution , distortionless , relatively simple system structure , low costs and convenient realization way . they have a broad application prospect
  激光干涉光刻技术研究四川大学博士学位论文理论研究、计算模拟和实验结果分析表明，无掩模激光干涉光刻和全息光刻具有大视场、高分辨率、无畸变、系统相对简单、成本较低，实现方便等特点，具有广阔的应用前景。
• The methods and systems ( including amplitude division double - beam interference system , three - beam interference system , liquid immersion type deep uv interference system and full automatic interference photolithographic system ) for amplitude division maskless laser interference photolithography are studied and compared
  研究和比较了振幅分割无掩模激光干涉光刻方法和系统，包括振幅分割双光束干涉系统、三光束干涉系统、液浸式深紫外干涉系统及全自动干涉光刻系统。

• 无掩模的日语：マスクレス