功函数的英文

• function, work
• work function
• work-function

• "功"英文翻译    exploit; merit; meritorious ...
• "函数"英文翻译    function
• "【理】功函数。" 英文翻译 :    work function
• "表面功函数" 英文翻译 :    surface work function
• "成功函数" 英文翻译 :    success function
• "电子功函数" 英文翻译 :    electronic work function
• "光电功函数" 英文翻译 :    photoelectric work function
• "内功函数" 英文翻译 :    inner work function
• "外功函数" 英文翻译 :    outer work function; outerwork function
• "逸出功，功函数" 英文翻译 :    work function
• "有效功函数" 英文翻译 :    effective work function
• "工作函数；功函数" 英文翻译 :    work function
• "低功函数材料" 英文翻译 :    low-work-function material
• "功函数等级的材料" 英文翻译 :    material with graded work function
• "光电发射功函数" 英文翻译 :    photoelectric work function
• "功函" 英文翻译 :    work content; work function
• "偏摩尔功函" 英文翻译 :    partial molal work content
• "函数" 英文翻译 :    [数学] function◇函数计算机 function computer; 函数计算器 function calculator; 函数运算 functional operation
• "基函数, 原函数" 英文翻译 :    primary function
• "fortran函数" 英文翻译 :    fortran function
• "helper函数" 英文翻译 :    helper function
• "hermite函数" 英文翻译 :    hermite function
• "hook函数" 英文翻译 :    hook function
• "h函数" 英文翻译 :    h function
• "l函数" 英文翻译 :    l function

• On the other hand , oxygen plasma treatment makes ito film oxidized further , which decreases the number of oxygen vacancy and sn ~ ( 4 + )
  另一方面,氧等离子体处理使ito薄膜表面的富sn氧化物进一步氧化,形成稳定的sno ,减少了ito薄膜表面的氧空位和sn ~ ( 4 + )数量,使其功函数增大。
• 2 . after studying the relevant basic theories , the relationship between the field emission current and the work function of semiconductor and the temperature is analyzed
  2 、研究了真空微电子压力传感器的相关基础理论，从理论上分析了半导体场致发射电流与半导体功函数及其与温度的关系。
• An atomic smictufal model for c ( 2x2 ) reconstruction is proposed and a total energy calculation illustrates that the hollow - site - occupied si adatom model might be a possible atomic structure of the c ( 2x2 ) reconstruction
  光电子发射谱被用于研究界面形成过程中出zp 、 hf4f芯能级谱和价带谱，以及功函数等的变化。
• As compared with amorphous diamond on si , the reduction of the applied electric field for the electron emission can be effectively improved by using sm / amorphous diamond contact
  我们发现非晶钻石长在镀钐的硅基板比单纯长在硅基板上的场发射特性更好，主要是因为金属有相对较低的功函数，可以降低金属钻石接面的位障高度。
• When we produce field emitting cold cathodes , we must consider not only the work function , conductance , density , reliability and mission capability but also the demand of technique
  在制备场发射阴极时,必须考虑到材料功函数、电导率、密度、热稳定性、化学稳定性等因素对其发射性能的影响,同时要考虑材料对加工工艺上的要求。
• Because of better conductivity , higher transparency , smoother surface and higher work function , ito ( indium tin oxide ) films are used as the transparent electrodes which are the emitting side in oled
  Oled显示器件经常采用ito膜作为有机发光的出射面和透明电极,要求ito膜可见光透过率、导电性、表面平整度以及功函数都很好。
• According to experiments , lab6 , with high conductivity , good heat stability and chemical stability , low work function , and active cathode appearance , has become an ideal material for field emission array cathodes
  经试验证明,六硼化镧( lab6 )具有高导电率和良好的热稳定性、化学稳定性、低功函数以及活性阴极表面,因此从理论上成为了场发射阴极的理想材料。
• As one of the semiconductor - metal eutectic material ( sem ) , the rod - like eutectic in - situ composite of si & tasi2 has lower work function , excellent electrical transport and the schottky junctions , which was grown - in during the crystal growth step
  Si - tasi _ 2共晶自生复合材料作为半导体金属共晶材料( sem )之一，具有较低的功函数、良好的电传输特性和自生肖特基结等特点。
• After the streamlines and potential lines were plotted , the potential line of the hardening and softening parts were taken as the same ellipse form . in order to establish the softening elasto - plastic model of qi loess , the plastic potential function used is in a ellipse form and the plastic work function was used as its hardening parameter
  作流线和势线，揭示了势线的硬化部分和软化部分具有相同的椭圆曲线形式，采用椭圆来表示塑性势函数，以求待定塑性功函数为硬化参数的方法建立了q1黄土的软化型弹塑性本构模型。
• The main results are listed as follow : the contact relationship between metal and cd1 - xznxte is analyzed theoretically , finding that the main factors affecting ohmic contact are power functions of metal and semiconductor , and surface layer effective states as well , and meanwhile illustrating the laws of factors affecting on the contact resistance . accordingly , materials and construction of electrode film are designed
  取得的主要成果如下：理论分析了金属与cd _ ( 1 - x ) zn _ xte半导体的接触关系，给出了对金属与半导体形成欧姆接触产生影响的主要因素：金属、半导体的功函数和半导体表面态，以及这两种影响因素对接触电阻的影响规律。

• 功函数的法语：Travail de sortie
• 功函数的日语：仕事関数
• 功函数的韩语：일함수
• 功函数的俄语：Работа выхода
• 功函数的阿拉伯语：دالة شغل;
• 功函数的印尼文：fungsi kerja;