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位错密度的英文

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"位错密度"怎么读用"位错密度"造句

英文翻译手机手机版

  • density of dislocations
  • dislocation concentration
  • dislocation density
  • dislocation desity
  • epd

例句与用法

  • Gallium arsenide single crystal - determination of dislocation density
    砷化镓单晶位错密度的测量方法
  • There exists a strong correlation between initial surface morphology prior to ht growth and ht gan growth mechanism and eventual threading dislocation density in epilayers
    发现高温生长前样品的表面状态对随后生长的gan生长机制及最终外延层中的位错密度有很大影响。
  • In the relatively high dislocation density areas , dislocations form the relatively small cellular structure and there is few isolated dislocation within each cellular structure . here the profile of c concentration in the dimension of a cellular structure is " u " - shaped . the cell diameter increases as the dislocation density decreases , dislocations form the relatively large cellular structure and there are a few isolated dislocations within each cellular structure
    发现晶片中位错密度和分布严重影响碳的微区分布,高密度位错区,位错形成较小的胞状结构,胞内无孤立位错,碳在单个胞内呈u型分布;较低密度位错区,胞状结构直径较大,胞内存在孤立位错,碳在单个胞内呈w型分布。
  • We studied the effect of laser quenching ( harden by phase transformation ) on some representative mould steels . through measuring the rigidity on the surface of samples treated by laser heat treatment , and through photographing microstructures of the steel surface , we find many reasons attribute to high hardness . these reasons include ultra - fine grains , high density dislocation and more content of carbon in martensite
    我们研究的是激光淬火对几种典型模具钢的作用,通过对热处理后的试样的硬度分布的测定,用金相和电镜观察金相组织的变化,认为激光热处理产生高硬度的原因是晶粒细化、高的位错密度和高的马氏体含量。
  • The experimental results showed that firstly , the distribution of resistiveity , mobility , carrier concentration , epd and ab - epd in gaas substrate was not uniform ; secondly , the distribution of electrical parameters depended on that of epd and ab - epd ; thirdly , mesfet devices performance correlated with ab microdefects ; last , as shown by pl mapping results , it is substrate with better parameters quality that could provide more chance to fabricate good mesfet devices
    实验结果表明, lecsi - gaas的电阻率、迁移率、载流子浓度、位错密度和ab微缺陷分布都不是均匀的,且电参数的分布与ab - epd 、位错密度分布有关。制作的mesfet器件的性能参数分布与ab微缺陷有明显联系。从plmapping测量结果可以看出材料的衬底参数好,则pl谱的强度高, pl谱均匀性也好,器件参数也好,就有可能制作出良好的器件与电路。
  • As recent research and productive practice showed , such conventional parameters as dislocation densiry ( epd ) , charge carrier concentration , mobility were not enough to evaluate the si - gaas material ' s quality , let alone revealing the relationship between the quality of material and the performance of devices . on the other hand , recent research showed that ab microdefects had direct relationship with device performance , whose density ( ab - epd ) was more important than epd for revealing the relationship between the quality of material and the performance of devices
    近些年来的科研和生产实践均表明,现行的常规参数,如位错密度、载流子浓度、迁移率等对表征半绝缘砷化镓材料的质量是不充分的,特别是不能反映材料质量与器件性能之间的关系。近期的科研成果证明, ab微缺陷与器件性能有直接的关系,而且ab微缺陷密度( ab - epd )是比位错密度更加敏感、更加重要的参数。
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