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临界荷重的英文

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"临界荷重"怎么读用"临界荷重"造句

英文翻译手机手机版

  • critical load

例句与用法

  • In this paper , plasma - enhanced chemical vapor deposition ( pecvd ) technique was used to deposit the dielectric p - sio2 films and p - sion films on the silicon wafer under the conditions of low temperature and low pressure with teos organic sourse . this research was focused on the evaluation of film growth , hardness , stress , resistance and refractive index , by changing the experimental parameters including rf power , substrate temperature , chamber pressure , and the flow rates of teos , o2 , n2 . the results showed that the p - sio2 film was smooth , dense , and structurally amorphous
    实验结果显示,用pecvd法淀积的p - sio _ 2膜是一表面平坦且致密的非晶质结构的薄膜,与硅片衬底之间有良好的附着性;在中心条件时生长速率可控制在2600a / min左右;在基板温度410时有最大的硬度可达16gpa ;其应力为压缩应力,可达- 75mpa ;薄膜的临界荷重为46 . 5un 。
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