The results indicate : ( 1 ) the photocatalytic activity and hydrophilicity of tio2 film are affected by the factors of thickness , porosity and heat - treated temperature which lead to the changes of the hydroxyl content , adsorbability and surface roughness of the film 热处理温度、薄膜厚度、孔隙率等因素对掺银的tio :薄膜、 tioz一snoz 、 tioz一fezo3复合薄膜光催化和亲水性能的影响与对纯tio :薄膜的影响相似。
3 . the low dielectric silicate films were prepared by using poss sol - gel from hydrolyzation and condensation of y - methyl acryloyloxy propyl - triethoxysilane as template , and characterized by afm , bet and ellipsometer . a film with dielectric constant as low as 2 . 7 was obtained 3 、利用- (甲基丙稀酰氧)丙基三甲氧基硅烷水解缩和得到的poss溶胶作为模板剂制备得到了低介电薄膜材料，讨论了旋膜转速对薄膜厚度的影响。
Atomic layer deposition ( ald ) has attracted a lot of attention recently for its excellent deposition abilities , such as almost 100 % step coverage , accurate thickness control , large area uniformity , excellent process stability , and low processing temperatures 摘要最近原子层沉积( ald )吸引著许多的注意，原因在于它杰出的沉积技术能力，例如几乎100 %的阶梯覆盖、精准的薄膜厚度控制、大面积薄膜的均匀性、优异的制程稳定度与低温的制程。
We do research on the basic principle of optical monitoring for thin film thickness . the advantages and disadvantages are analyzed theoretically . the improvement against the disadvantages and the ways to enhance the accuracy of the optical monitor are proposed 本文首先对薄膜厚度的光学监控法的基本原理进行了研究，从理论上分析了该方法的优点和不足，针对其不足讨论了相应的改善办法，并提出了探讨了提高光学监控法监控精度的方法。
