In order to investigate the effect of high - field hot - carrier on devices and circuits , the electrical stress experiment is carried out with 1 . 2 n m , 1 . 0 n m and 0 . 8 u m channel length home - made mosfet ' s by the monitor system with ate and cat technology . by using the fresh and degraded experiment data , bsim2 model parameters are extracted 为了分析研究高场热载流子效应对器件和电路特性可靠性的影响，采用自动测试与cad技术相结合的监测系统，对国内沟道长度1 . 2 m 、 1 . 0 m和0 . 8 m的mosfet进行了电应力退化实验，并根据实验结果提取了退化前后器件的bsim2模型参数。
This paper also presented the structure of soi bjmosfet and discussed and analyzed the advantages of this device by comparing with the bulk bjmosfet . its advantages are as fellow : no latch - up effect , better capability of resisting invalidation , much smaller parasitic capacitance , weaker hot - carrier effect and short - channel effects , and simpler technics , and so on 通过与体硅bjmosfet比较，讨论和分析了soibjmosfet的优点：无闩锁效应、抗软失效能力强、寄生电容大大降低、热载流子效应减弱、减弱了短沟道效应、工艺简单等。
Based on the hydrodynamic energy transport model , the influence of variation of negative junction depth caused by concave depth on the characteristics of deep - sub - micron pmosfet has been studied . the results are explained by the interior physical mechanism and compared with that caused by the source / drain depth . research results indicate that with the increase of negative junction depth ( due to the increase of groove depth ) , the threshold voltage increases , the sub - threshold characteristics and the drain current driving capability degrade , and the hot carrier immunity becomes better in deep - sub - micron pmosfet . the short - channel - effect suppression and hot - carrier - effect immunity are better , while the degradation of drain current driving ability is smaller than those with the increase of depth of negative junction caused by source / drain junction shallow . so the variation of concave depth is of great advantage to improve the characteristics of grooved - gate mosfet 基于能量输运模型对由凹槽深度改变引起的负结深的变化对深亚微米槽栅pmosfet性能的影响进行了分析，对所得结果从器件内部物理机制上进行了讨论，最后与由漏源结深变化导致的负结深的改变对器件特性的影响进行了对比.研究结果表明随着负结深(凹槽深度)的增大，槽栅器件的阈值电压升高，亚阈斜率退化，漏极驱动能力减弱，器件短沟道效应的抑制更为有效，抗热载流子性能的提高较大，且器件的漏极驱动能力的退化要比改变结深小.因此，改变槽深加大负结深更有利于器件性能的提高
Considering the unsymmetrical distribution of interface states induced by hot - carrier effects along the channel , the quasi - two - dimensional analysis methods are used to deduced the drain current , threshold voltage and electrical field in channel after hot - carrier degradation and the theoretical results are fully verified with the experimental data and m1ntmos6 . 0 simulation output . the degradations of device output conductance , subthreshold conduction and rf characteristics are also analyzed 针对mos器件热载流子退化所引入的界面态，根据其沿沟道非均匀分布的模型，采用准二维分析方法对退化后器件的漏源电流、阈值电压和饱和区沟道电场作了详细的理论推导，并与实验结果和器件二维数值模拟软件minimos6 . 0的计算结果进行了验证比较。
