Our factory specializes in manufacturing cabinet vacuum coaters , magnetic control sputter coaters and vacuum exhaust equipments , industrial boiler , all kinds of valves , coaters and press packer specially used in the industry of quartz crystal 我厂是国内专业生产箱式真空镀膜机、磁控溅射镀膜机、真空排气设备、石英晶体行业专用被银机和压封机、工业炉及各种真空阀门设计制造的专业厂家。
It is reasonably designed and easily managed ; it can plate many kinds of membranes that multi - arc machine can not do , such as bnb - black , pearl black and different azotizing , oxidizing membranes with top - grade quality and combination , fit for the decorative and tools plating 二特点该设备结构合理，操作简单，可以镀制各种多弧镀膜机无法完成的膜层，枪黑珍珠黑及各种氮化氧化膜层，膜层细腻，结合力好，广泛用于装饰镀膜及工具镀膜。
Using jgp560c magnetron sputtering equipment , cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power , gas flow , vacuum air pressure , magnetoelectricity power and substrate temperature on deposition rate of film , discovered that dc sputtering power is the most key factor influencing the deposition rate 在jgp560c型超高真空多功能磁控溅射镀膜机上，采用直流磁控溅射法在cdznte晶体上制备出cu ag合金薄膜，揭示了气体流量、直流溅射功率、励磁电源功率、工作气压和衬底温度等工艺参数对沉积速率的影响规律。结果表明溅射功率对沉积速率的影响最大，随溅射功率的增大沉积速率快速增大。
This paper presents the effects of some features on the productivity of raw c60 materials , such as distance and approaching speed of electrodes , helium partial pressure and arc current etc . then we separate and purify the raw materials and obtain pure solid c60 of 99 . 9 % and compare the purification efficiency and effect of different fluxion phase and fixed phase and discuss the effects of the experimental conditions , such as the depositing speed , the type of the substrate , the surface structure of the substrate and the temperature of the substrate . finally , we use xps , afm , ultraviolet , infrared and raman to analyze the component , structure and feature of the films qualitatively and quantitatively 本文首先研究了氦气分压、弧电流大小、电极间距以及电极推进速度等实验条件对制备c _ ( 60 )粗品产率的影响；接着选用柱色谱法分离提纯得到了纯度大于99 . 9的c _ ( 60 )固体，比较了不同流动相和固定相的提纯效率和效果；然后采用自己改进后的真空镀膜机，利用电阻式加热蒸镀方法，得到了纯c _ ( 60 )薄膜和不同掺杂比的银掺杂薄膜；探讨了沉积速率、衬底种类、衬底表面结构以及衬底温度等实验条件对薄膜结构的影响；最后通过xps ， afm ，紫外，红外，拉曼对薄膜的成分、结构和特性作了定性和半定量分析。
Sio2 films are prepared on silicon substrates in order to get the functions of the main experiment parameters such as rf power , gas flow , vacuum gas pressure , target - substrate distance and substrate temperature on deposition rate of films . the optimized parameters ranges are obtained by considering films deposition rate , composition and structure 在bms450型磁控溅射镀膜机上优化出了制备sio _ 2薄膜的工艺参数范围，并揭示了气体流量、射频功率、靶基距、衬底温度、溅射气压等参数对薄膜沉积速率的影响规律。
