刻蚀

• On the basic of theory , experimental studies on laser cutting and polishing diamond film were carried out
  并且在实验研究的基础上，分析了激光刻蚀金刚石材料的基本规律。
• Fabrication of ultra deep electrical isolation trenches with high aspect ratio using drie and dielectric refill
  用深反应离子刻蚀和介质填充技术制造具有高深宽比的超深电隔离槽
• The reactor is capable of working in the rie ( reactive ion etching ) mode and also in the plasma etching mode
  反应腔拥有在rie (反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
• Otherwise , the thinner mask thickness or larger etching width is , the higher etching velocity and larger depth raise
  比较小的掩膜厚度和大的刻蚀线宽都有利于刻蚀的速度和深度。