Then the model and wind tunnel test of thermal shear stress sensor array had been discussed , and the thermal analysis of the device was performed by ansys . the temperature profile of thermal structure . the thesis give a good reference to design of the comb capacitance and the thermal cavity shear stress sensor used in the smart skin 在此基础上，对热敏式微型剪应力传感器的阵列结构设计、连接材料选取以及微型剪应力传感器的风洞试验进行了研究，并用ansys软件对热敏式微型剪应力传感器的空腔薄膜结构进行热分析，得到空腔薄膜结构的温度分布云图。
The study of the mn : bi influence on the structure of mnbial film shows that , on the base of the same al content , only the specimen with mn : bi 1 : 0 . 92 possesses single phase structure of mnbi orienting in < 002 > . with the whole thickness fixed , the structure of sole layer specimen [ bi / al / mn ] is more integral than that of double layers specimen [ bi / al / mn / bi / al / mn ] 对mn ： bi原子比( al含量一定)及多层膜周期数(总厚度一定)对溅射mnbial薄膜结构影响的研究表明，当al的含量一定， mn ： bi原子比为1 ： 0 . 92时，可制备出结构完整的mnbial薄膜，总厚度不变的情况下，单周期mnbial比双周期的mnbial具有更强的002取向结构。
The accurate calculation and analysis of the external loading and cooperative analysis becomes possible . through the systematic parameter analysis of the static performance of membrane structure and the analysis of several real projects , the understanding of the force baring performance with external loads is more clear 本文进一步对薄膜结构进行了较系统的静力性能分析，研究了几个主要参数对其产生的影响，并做了实际工程算例分析，从而对薄膜结构在载荷阶段的受力性能有了一定的认识。
When the membrane deforms parabolid , the geometry and equilibrium equation are educed in the condition of large displacement , large rotation and small strain . that is to say , the expression of strain should include quadratic term of displacement and equilibrium equation should be established after the structure had deformed 对于大位移、大转角和小应变条件下的薄膜结构,在压力作用下变形到抛物面时,推导出其几何方程和平衡方程,即应变表达式应包括位移的二次项,平衡条件应建立在变形后的位形上。
The properties of cn thin films such as their morphology , component , crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed , showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique , , the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed . the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process , based on this the growth mode of cn thin films on the si substrate is proposed . the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted , which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate 采用pld技术进行了碳氮化合物薄膜沉积，得到了含氮量为21at的cn薄膜；研究了衬底温度和反应气体压强对薄膜结构特性的影响，给出了cn薄膜中n含量较小、 sp ~ 3键合结构成分较少和薄膜中仅含有局域cn晶体的原因；引入脉冲辉光放电等离子体增强pld的气相反应，给出了提高薄膜晶态sp ~ 3键合结构成分和薄膜的含n量可行性途径；应用pe - cvd技术以ch _ 4 + n _ 2为反应气体并引入辅助气体h _ 2 ，得到了含n量为56at的晶态cn薄膜；探讨了cn薄膜形貌、成分、晶体结构、价键状态等特性及其与气体压强和放电电流的关系，证明了- c _ 3n _ 4薄膜沉积为满足动力学平衡条件的各种反应过程的竞争结果；采用光学发射谱技术对cn薄膜生长过程进行了实时诊断，得到了实验参量对等离子体中活性粒子相对浓度和气相反应过程的影响规律，给出了cn薄膜沉积的主要反应前驱物，揭示了cn薄膜特性和等离子体内反应过程之间的联系；采用高气压pe - pld技术研究了不同衬底温度条件下cn化合物薄膜的结构特性，揭示了si原子对薄膜生长过程的影响，给出了si基表面碳氮薄膜的生长模式；在金刚石研磨和催化剂fe处理的si衬底上进行cn薄膜沉积，证明了通过控制材料表面动力学条件可以改变碳氮薄膜结构特性，并可显著提高晶态碳氮材料的生长速率。
In this paper , organic small molecules and polymer films were prepared via electrostatic self - assembled method and spin - coating method . the characteristics of films are examined by uv - vis , pl , xps , raman and so on . and some theories are investigated with respect to organic molecules and polyionic deposition on solid surface and the photoelectric characteristics of organic ultrothin films 采用紫外-可见光吸收光谱、荧光光谱、 x射线光电子能谱、拉曼光谱及低角度x射线衍射光谱等技术手段对有机材料及薄膜进行表征和性能测试，分析了有机分子、聚离子在固体表面成膜性能以及有机超薄膜结构的光电特性等。
