The research results show that iil can get the high resolution more effectively than conventional optical lithography ( ol ) 研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
After calibration , the distribution of the dot array can be calculated according the etching parameters and distance of diffraction 系统标定好后,衍射点阵在平面上的分布情况可根据光刻参数和衍射距离计算得到。
We can improve the image quality by above method at a certain extent , however there are some limitations in technology and craft 以上几种方法均能一定程度的改善光刻图形质量，但也有一些技术或工艺方面的局限。
The exposure dose distribution and line width control for the laser direct writing system are analyzed . some experiments are also carried out 对激光直写光刻的曝光量分布和线宽控制进行了相关理论分析和实验。
The process of su - 8 photoresist lithography is researched , and the influence of steps like coating and soft - bake on the lithography is studied 初步研究了su - 8胶的光刻工艺流程,讨论了涂胶、前烘等各个步骤对光刻结果的影响。
Lectures and laboratory sessions focus on basic processing techniques such as diffusion , oxidation , photolithography , chemical vapor deposition , and more 课堂讲授和实验课重点介绍了基本制程技术，如扩散、氧化、光刻、化学气相沉积等。
