Compound medium wave - guide film on columned li - ferrites was made by magnetron sputtering system 用磁控溅射的方法在圆柱锂铁氧体表面镀覆了复合介质波导薄膜。
Crystal structure and metal - insulator transition properties of dc magnetron sputtered la0 . 825sr0 . 175mno3 films 直流磁控溅射沉积锰酸锶镧薄膜的结构与相变特性研究
Preparation of high quality cubic boron nitride film by radio frequency magnetron sputtering and its characterization 高质量立方氮化硼薄膜的射频磁控溅射制备及其性能表征
Raman spectroscopy was used to analyze the structure . ge - ga - s - s glass films were deposited by rf magneto sputtering 利用磁控溅射法制备了两个组分的ge - ga - s - se玻璃薄膜。
Helium - charged al films are prepared by direct current ( dc ) magnetron sputtering with a he / ar mixture 摘要采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。
Study of the wear resistance of titanium alloy subject to complex surface treatment by micro - arc oxidation and magnetron sputtering 微弧氧化与磁控溅射复合处理的钛合金表面耐磨性研究
High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature 摘要本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering 摘要采用射频磁控溅射技术在改性氟塑料表面沉积铝层，制备了金属氟化高聚物复合薄膜。
Ultrathin aluminum films were prepared by dc reactive magnetron sputtering . the target was made by 99 . 999 % pure aluminum 采用直流磁控溅射法溅射纯度为99 . 999 %的铝靶制备了超薄铝膜。
In the first part of the thesis tin film in different n2 partial pressure prepared by reactive magnetron sputtering is studied 本文首先研究了磁控溅射法在不同氮气分压下所制备的tin薄膜。
