The best process for high quality tio _ ( 2 ) thin film deposited on k9 glass by reb is studied by using orthogonal test method , the se results indicate that the best process for tio _ ( 2 ) thin film deposition is the substrate temperature of 300 , the total gas press in the chamber of 2 x 10 ~ 2pa and the deposition rate of 0 . 2 nm - s - 1 , of which the substrate temperature has influence on the optical properties of the deposited films notably 文中首先以tio _ 2薄膜的折射率和消光系数为研究对象，采用l9正交试验法研究了在k9玻璃上制备高光学质量tio _ 2薄膜的最佳工艺条件。椭圆偏振仪的测试结果表明，制备tio _ 2薄膜的最佳工艺条件为：基片温度300 ，工作真空2 10 ~ ( - 2 ) pa ，沉积速率0 . 2nm ? s ~ ( - 1 ) ，其中基片温度对薄膜光学常数的影响最大，该结果具有较好的可重现性。
A comparison of the optical and mechanical performance is made between with iad and without iad . the optical performances include the refractive index the extinction coefficient the packing density the vaccum - to - air shift and the afm images of the surface ; the mechanical performances include the adhesion and the hardness 光学特性涉及折射率、消光系数、波长漂移、聚集密度和表面粗糙度，机械特性涉及硬度和附着力。通过研究，发现离子辅助沉积对单层薄膜的光学特性和机械特性均有明显改善。
Based on the analysis of the effect on the maximum range of the equation ' s each parameter and the traditional method of extinction ratio , the noncooperative regulable attenuation - measure the minimum detectable power of laser altimeter on the condition of constant miss probability by attenuating the laser power transmitting to the diffuse reflected simulant target - was put forward 在传统的消光系数法基础上，根据对月测距方程各系数的影响权重分析，提出了非合作目标可调衰减法，即：通过对漫反射模拟目标，衰减出射激光功率，在一定的漏警概率条件下测量激光高度计的最小可探测功率。
The results is the following . ( 1 ) with the condition of table 4 . 1 , the low reflectance vale will move towards the center wavelenghth ( 550nm ) , the influence on refractive index of the films is very little , the extinction coefficient ( k ) have trend of increase and the thickness of the films decrease when increasing the oxygen flow . the rutile phase increase and the surface morphology is dense and smoothnes with increasing the oxygen flow 其结论如下: ( 1 )随着氧流量的增加薄膜的反射低谷向中心波长550nm处移动;消光系数k随氧流量的增加有增大的趋势;氧流量的变化对折射率的影响不大;薄膜的厚度随氧流量的增加而减少;氧流量增加薄膜中的金红石相tio2含量增多,薄膜表面由粗糙疏松变的致密光滑。
