光刻

• Determining pinhole density in photoresist films used in microelectronic device processing
  微电子器件加工过程用的光刻膜中针孔密度的测定
• Actuality and development of ultra - clean and high pure chemical reagents and photoresists in china
  我国超净高纯试剂和光刻胶的现状与发展
• The design of manganin film and copper film were etched by the first time
  首次采用以半导体光刻的方法来刻蚀锰铜敏感薄膜和铜电极薄膜的图形。
• An experimental double - beam and double - exposure interference photolithographic system has been established
  建立了双光束双曝光干涉光刻实验系统。
• Pre - exposure bake ' s time has been extended in light etching course for favorable patterns
  在光刻工艺过程中，适当延长前烘时间可得到良好的显影图案。
• The paper also emphatically studies some main applications of interferometric lithographic technology
  故本文还着重研究了干涉光刻技术的一些主要应用。
• Analyse to the experimental data shows that there is still much potential to increase the aspect ratio
  对实验结果的分析表明,进一步提高光刻深宽比的空间很大。
• The branch split - ratio is decided by practical fabrication process , so we have n ' t discussed it
  另外，分支比是由版图和光刻工艺实现的，所以没有进行详细讨论。
• Responsible for implant / diffusion / etch / photo new process development , process in - line control and development
  负责注入/扩散/刻蚀/光刻新工艺的开发及在线控制。
• A computer - aid pattern automatic placement system is designed based on the finite state machine model
  摘要采用有限状态机模型设计了集成电路光刻版上各个图形布局的自动系统。