The exposure dose distribution and line width control for the laser direct writing system are analyzed . some experiments are also carried out 对激光直写光刻的曝光量分布和线宽控制进行了相关理论分析和实验。
In manual operation or exposure compensation , the exposure indicator in the viewfinder display indicates the difference between the correct exposure value ( ev ) and the current exposure compensation setting 手动操作或补偿曝光时,取景器显示的曝光指示灯表示正确曝光量( ev )和当前曝光补偿设置的差值。
The times of the pedestrians keeping away from the passing vehicles are adopted in the exposure index , and the kinetic energy of vehicle impact on the pedestrians are considered in the severity index 经过曝光量指标与风险指标的检核过程，证实本研究所建立的人车冲突风险指标确实能够反映地区性道路的交通安全状况。
Different resolution pixels have a series of transmission coefficient , according to this , feature of biological specimen , we device a protein model with several differnt high steps 摘要按照生物样品分辨单元具有多种透过率的特点，设计了一个多衬度的台阶状蛋白质模型，根据曝光量与衬度，信噪比，抗蚀膜性能的关系，确定了曝光量。
It is reported that underwater photography requires the photographer to be physically strong and technically superb enough to adjust the exposure at any moment as the demand varies with the depth of water and the velocity of the flow 据了解,水下摄影对人的体质要求很高,还要随着水的深度、流速变化随时调节曝光量,对摄影技术的要求相当高。
The experiment results show that there are optimal defocus distance and exposure for the given system and recording material , and to obtain the best snr different reference - to - object beam ratios are also needed for black - white digital images of different space frequencies 实验结果表明，对于给定的系统及记录介质存在一定的最佳离焦量和曝光量，而对于不同空间频率的黑白二值条纹图像还需要采用不同参?物光比以最终获得最佳的信噪比。
Intensity distribution in photoresist is analyzed during ldw exposure process in terms of the improved theoretical model and the method of selecting the optimal exposure is described . results of ray - tracing using zemax that is optical design software agree well with the calculated results of theoretical model and l dw experimental results verify the accuracy of the model . therefore this improved model is important significant for directing ldw research 本文完善了激光直写光刻理论，分析了直写曝光中胶层内光场的分布，探讨了最佳曝光量的选择方案，利用zemax软件进行光线追迹的结果和理论模拟十分相近，实验结果验证了理论模型的正确性，该理论模型对激光直写光刻技术研究具有重要指导意义。
